PlasmaPro NGP1000 PECVD System. Designed for the deposition of SiO2 and SiNx layers.

  • The NGP1000 PECVD has been specifically developed for passivation deposition in HBLED production
  • Its large area electrode and optimised showerhead design allows up to 61 x 2”, 15 x 4” or 7 x 6” wafers in a single load