PlasmaPro NGP1000 Etch System. Designed for GaN, AlGaInP and Sapphire etch.

  • Building on over 20 years experience of compound semiconductor processing, optimised etch processes offer excellent batch throughput for all etching applications.
  • Batch sizes from 55 x 2”, 13 x 4” or 5 x 6” with cross batch uniformity of <+/-5%, yielding market leading volumes of wafers/month.