Superior Technical Capabilities of the PlasmaPro Estrelas100

  • Compatible with wafer sizes from 50mm to 200mm
  • Flexible configuration providing the ability to develop devices that can be taken to production using the same chamber hardware
  • Mechanical cryo and electrostatic clamp options
  • Heated liners up to 150°C
  • Increased plasma stability, eliminating ‘first wafer effect’
  • Reduced polymer build up, increasing the mean wafers between mechanical cleans
  • Fast acting closed coupled MFCs utilising software originally designed for atomic layer deposition
  • Reduced chamber volume ensuring high gas conductance and short step times
  • Low Cost of Ownership through optimised hardware and process control