Nanofab system features

 Feature Nanofab700 Nanofab800Agile
Table Size Up to 200mm wafer Up to 200mm wafer
Load lock Installed Installed
Liquid Precursor Compatibility Compatible Compatible
Generator Frequency Range RF (13.56MHz), LF (50-460KHz) RF (13.56MHz), LF (50-460KHz)
General PECVD Process Oxide, Nitride, Oxynitride, a-Si Oxide, Nitride, Oxynitride, a-Si
Catalyst Pretreatment Capable Capable
Process for Nanomaterials Carbon Nanotubes, Si, ZnO Nanowires Carbon Nanotubes, Si Nanowires
Table Temperature Range Room Temp to 700C Room Temp to 800C
Temperature Agility Ordinary Ramp Rate Very High Ramp Rate
O2 atmosphere compatibility (<400C) Compatible Compatible
O2 atmosphere compatibility (>400C) Compatible Non-Compatible
Extra power supply for installation Required Required
Extra gasline for installation Not Required Required