Webinar: Latest Advances in Plasma Techniques used for ALD

地点:
Institute of Physics (IOP) and Oxford Instruments Plasma Technology, 英国
日期:
2012年11月8日
主要业务:
等离子技术
网站:
event.on24.com/eventRegistration/EventLobbyServlet...

This webinar was recorded on the 8th November 2012 and is now available on demand

Atomic layer deposition (ALD) has established itself as the deposition technique of choice for ultra-thin, controlled, conformal, pin-hole free coatings. In an age of nanotechnology advances ALD is an ideal tool for depositing on nanoscale features.
 
Professor Erwin Kessels discussed:
 
  • Recent advances in plasma ALD processing through careful control of the ion energies and plasma conditions to tune the properties of the materials being deposited
  • Applications of ALD that have benefited from advanced plasma techniques
The webinar ran for 45 minutes and included time for questions and answers at the end.

 

Speakers

Prof. Erwin Kessels
Eindhoven University of Technology
 
Chris Hodson
ALD product manager, Oxford Instruments

James Tyrrell
Editor, nanotechweb.org